• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
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    • 专利摘要:

    公开号:NL1036860A1
    申请号:NL1036860
    申请日:2009-04-16
    公开日:2009-10-26
    发明作者:Jacobus Frederik Molenaar；Michael Johanne Vervoordeldonk；Funda Sahin Nomaler
    申请人:Asml Netherlands Bv；
    IPC主号:
    专利说明:

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    FIELD
    The present invention relates to a lithographic apparatus that includes a bearing configured to support a first part of the lithographic apparatus with respect to a second part of the lithographic apparatus such that the first part is moveahle with respect to the second part.
    BACKGROUND
    A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). In such a case, a patterning device, which is alternatively referred to as a mask or a reticle, may be used to generate a circuit pattern to be formed on an individual layer of the IC. This pattern can be transferred onto a target portion (e.g., including part of, one, or several dies) on a substrate (e.g., a silicon wafer). Transfer of the pattern is typically via imaging onto a layer of radiation-sensitive material (resist) provided on the substrate. In general, a single substrate will contain a network of adjacent target portions that are successively patterned. Conventional lithographic apparatus include so-called steppers, in which each target portion is irradiated by exposing an entire pattern onto the target portion at once, and so-called scanners, in which each target portion is irradiated by scanning the pattern through a radiation beam in a given direction (the "scanning" direction) while synchronously scanning the substrate parallel or anti-parallel to this direction. It is also possible to transfer the pattern from the patterning device to the substrate by imprinting the pattern onto the substrate.
    United States Patent Application Publication No. 2005/0168086 discloses a magnetic floating device provided with a bearing configured to support a first part of the lithographic apparatus with respect to a second part, such that the first part is moveable with respect to the second part, and the first part being provided with at least one permanent magnet and the second part being provided with at least two permanent magnets which are positioned aside the at least one permanent magnet or the first part.
    SUMMARY
    It is desirable to provide an improved bearing.
    [0005] According to an embodiment of the invention, there is provided a lithographic apparatus that includes an illumination system configured to provide a radiation beam and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus further includes a substrate table configured to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a bearing configured to support a first part of the lithographic apparatus with respect to a second part or the lithographic apparatus in a first direction such that the first part is moveable in a second direction relative to the second part. The second direction is substantially perpendicular to the first direction. The first part is coupled to at least one permanent magnet and the second part is coupled to at least two permanent magnets. The permanent magnet or the first part is positioned substantially between the permanent magnets or the second part. A field orientation of the permanent magnets is substantially parallel to the first direction and the least one permanent magnet or the first part has a substantial opposite polarity to the least one of the magnets of the second part. The bearing restricts rotational movement of the first part around the second direction and it restricts rotational movement of the first part around a third direction. The third direction is substantially perpendicular to the first direction and the second direction.
    [0006] According to an embodiment of the invention, there is provided a device manufacturing method that includes providing a substrate that is at least partially covered by a layer of radiation-sensitive material on a substrate table, providing a patterning device on a support, projecting a patterned beam of radiation onto the layer of radiation sensitive material, supporting with a bearing a first part of the lithographic apparatus with respect to a second part of the lithographic apparatus in a first direction such that the first part is moveable in a second direction relative to the second part. The second direction is substantially perpendicular to the first direction. The first part is coupled to at least one permanent magnet, and the second part is coupled to at least two permanent magnets. The permanent magnet or the first part is positioned substantially in between the permanent magnets or the second part and a field orientation of the permanent magnets is substantially parallel to the first direction. The least one permanent magnet or the first part has a substantially opposite polarity at least one of the magnets or the second part. The method further includes restricting rotational movement of the first part around the second direction, restricting rotational movement of the first part around a third direction, the third direction is substantially perpendicular to the first direction and the second direction, moving the first part with respect to the second part, developing the layer of sensitive material on the substrate, and manufacturing a device from the developed substrate.
    LETTER DESCRIPTION OF THE DRAWINGS
    Embodiments of the invention will now be described, by way of example only, with reference to the accompanying schematic drawings in which corresponding reference symbols indicate corresponding parts, and in which: [0008] Figure 1 depicts a lithographic apparatus according to an embodiment of the invention; Figure 2 schematically depicts a bearing for use in a lithographic apparatus according to an embodiment of the invention; Figure 3 depicts a view in three dimensions of the bearing of Figure 2; Figure 4 depicts a support for supporting a patterning device or a reticle masking device in a lithographic apparatus according to the invention; Figure 5 depicts the support of Figure 4 according to an embodiment of the invention that includes actuators and sensors; Figures 6A and B depict configurations of permanent magnets according to further elaborations of the invention; Figures 7 A, B and C depict configurations of permanent magnets according to further differentiation of the invention; and Figure 8 depicts configurations of permanent magnets according to a further embodiment of the invention.
    DETAILED DESCRIPTION
    Figure 1 schematically depicts a lithographic apparatus according to one embodiment of the invention. The apparatus includes an illumination system (illuminator) IL configured to condition a radiation beam B (eg UV radiation or any other suitable radiation), a mask support structure (eg a mask table) MT constructed to support a patterning device (eg a mask) MA and connected to a first positioning device PM configured to accurately position the patterning device in accordance with certain parameters. The apparatus also includes a substrate table (eg a wafer table) WT or "substrate support" constructed to hold a substrate (eg a resist-coated wafer) W and connected to a second positioning device PW configured to accurately position the substrate in accordance with certain parameters. The apparatus further includes a projection system (e.g. a refractive projection lens system) PS configured to project a pattern imparted to the radiation beam B by patterning device MA onto a target portion C (e.g. including one or more dies) or the substrate W.
    The illumination system may include various types of optical components, such as refractive, reflective, magnetic, electromagnetic, electrostatic or other types of optical components, or any combination thereof, for directing, shaping, or controlling radiation.
    The mask support structure supports, i.e. bears the weight of, the patterning device. It holds the patterning device in a manner that depends on the orientation of the patterning device, the design of the lithographic apparatus, and other conditions, such as for example whether or not the patterning device is a hero in a vacuum environment. The mask support structure can use mechanical, vacuum, electrostatic or other clamping techniques to hold the patterning device. The mask support structure may be a frame or a table, for example, which may be fixed or movable as required. The mask support structure may ensure that the patterning device is at a desired position, for example with respect to the projection system. Any use of the terms "reticle" or "mask" may be considered synonymous with the more general term "patterning device." The term "patterning device" used should be broadly interpreted as referring to any device that can be used to impart a radiation beam with a pattern in its cross-section so as to create a pattern in a target portion of the substrate . It should be noted that the pattern imparted to the radiation beam may not exactly correspond to the desired pattern in the target portion of the substrate, for example if the pattern includes phase-shifting features or so called assist features. Generally, the pattern imparted to the radiation beam will correspond to a particular functional layer in a device being created in the target portion, such as an integrated circuit.
    The patterning device may be transmissive or reflective. Examples of patterning devices include masks, programmable mirror arrays, and programmable LCD panels. Masks are well known in lithography, and include mask types such as binary, alternating phase shift, and attenuated phase shift, as well as various hybrid mask types. An example of a programmable mirror array employs a matrix arrangement of small mirrors, each of which can be individually tilted so as to reflect an incoming radiation beam in different directions. The tilted mirrors impart a pattern in a radiation beam which is reflected by the mirror matrix.
    The term "projection system" used should be broadly interpreted as encompassing any type of projection system, including refractive, reflective, catadioptric, magnetic, electromagnetic and electrostatic optical systems, or any combination thereof, as appropriate for the radiation exposure being used, or for other factors such as the use of an immersion liquid or the use of a vacuum. Any use of the term "projection lens" may also be considered as synonymous with the more general term "projection system".
    As depicted here, the apparatus is of a transmissive type (e.g., employing a transmissive mask). Alternatively, the apparatus may be of a reflective type (e.g., employing a programmable mirror array or a type referred to above, or employing a reflective mask).
    The lithographic apparatus may be of a type having two (dual stage) or more substrate tables or "substrate supports" (and / or two or more mask tables or "mask supports"). In such "multiple stage" machines the additional tables or supports may be used in parallel, or preparatory steps may be carried out on one or more tables or supports while one or more other tables or supports are being used for exposure.
    The lithographic apparatus may also be a type of at least a portion of the substrate may be covered by a liquid having a relatively high refractive index, e.g., water, so-to-fill space between the projection system and the substrate. Liquid immersion may also be applied to other spaces in the lithographic apparatus, for example, between the mask and the projection system. Immersion techniques can be used to increase the numerical aperture of projection systems. The term "immersion" as used does not mean that a structure, such as a substrate, must be submerged in liquid, but rather only means that a liquid is located between the projection system and the substrate during exposure.
    Referring to Figure 1, the illuminator IL receives a radiation beam from a radiation source SO. The source and the lithographic apparatus may be separate entities, for example when the source is an excimer laser. In such cases, the source is not considered to be part of the lithographic apparatus and the radiation beam is passed from the source SO to the illuminator IL with the aid of a beam delivery system BD including, for example, suitable directing mirrors and / or a beam expander. In other cases the source may be an integral part of the lithographic apparatus, for example when the source is a mercury lamp. The source SO and the illuminator IL, together with the beam delivery system BD if required, may be referred to as a radiation system.
    The illuminator IL may include an adjuster AD configured to adjust the angular intensity distribution of the radiation beam. Generally, at least the outer and / or inner radial extent (commonly referred to as σ-outer and σ-inner, respectively) or the intensity distribution in a pupil plane or the illuminator can be adjusted. In addition, the illuminator IL may include various other components, such as an integrator IN and a condenser CO. The illuminator may be used to condition the radiation beam, to have a desired uniformity and intensity distribution in its cross-section.
    The radiation beam B is incident on the patterning device (e.g., mask MA), which is a hero on the mask support structure (e.g., mask table MT), and is patterned by the patterning device. Having traversed the mask MA, the radiation beam B passes through the projection system PS, which is the beam onto a target portion C or the substrate W. With the aid of the second positioning device PW and position sensor IF (eg an interferometric device, linear encoder or capacitive sensor), the substrate table WT can be moved accurately, eg so as to position different target portions C in the path of the radiation beam B. Similarly, the first positioning device PM and another position sensor (which is not explicitly depicted in Figure 1) can be used to accurately position the mask MA with respect to the path of the radiation beam B, eg after mechanical retrieval from a mask library, or during a scan. In general, movement of the mask table MT may be realized with the aid of a long-stroke module (coarse positioning) and a short-stroke module (fine positioning), which form part of the first positioning device PM. Similarly, movement of the substrate table WT or "substrate support" may be realized using a long-stroke module and a short-stroke module, which form part of the second positioner PW. In the case of a stepper (as opposed to a scanner) the mask table MT may be connected to a short-stroke actuator only, or may be fixed. Mask MA and substrate May be aligned using mask alignment marks M1, M2 and substrate alignment marks P1, P2. Although the substrate alignment marks as illustrated occupy dedicated target portions, they may be located in spaces between target portions (these are known as scribe-lane alignment marks). Similarly, in situations in which more than one that is provided on the mask MA, the mask alignment marks may be located between the dies.
    The depicted apparatus could be used in at least one of the following modes:
    1. In step mode, the mask table MT or "mask support" and the substrate table WT or "substrate support" are kept essentially stationary, while an entire pattern imparted to the radiation beam is projected onto a target portion C at one time (ie a single static exposure). The substrate table WT or "substrate support" is then shifted in the X and / or Y direction so that a different target portion can be exposed. In step mode, the maximum size of the exposure field limits the size of the target portion C imaged in a single static exposure.
    2. In scan mode, the mask table MT or "mask support" and the substrate table WT or "substrate support" are scanned synchronously while a pattern is imparted to the radiation beam is projected onto a target portion C (ie a single dynamic exposure). The velocity and direction of the substrate table WT or "substrate support" relative to the mask table MT or "mask support" may be determined by the (de-) magnification and image reversal characteristics of the projection system PS. In scan mode, the maximum size of the exposure field limits the width (in the non-scanning direction) or the target portion in a single dynamic exposure, whereas the length of the scanning motion has the height (in the scanning direction) of the target portion.
    3. In another mode, the mask table MT or "mask support" is kept essentially stationary holding a programmable patterning device, and the substrate table WT or "substrate support" is moved or scanned while a pattern is imparted to the radiation beam is projected onto a target portion C. In this mode, generally a pulsed radiation source is employed and the programmable patterning device is updated as required after each movement of the substrate table WT or "substrate support" or in between successive radiation pulses during a scan . This mode of operation can be readily applied to maskless lithography that utilizes programmable patterning device, such as a programmable mirror array or a type as referred to above.
    Combinations and / or variations on the modes described above or use or entirely different modes or use may also be employed.
    Figure 2 schematically depicts a bearing for use in a lithographic apparatus according to an embodiment of the present invention. The bearing supports a first part of the lithographic apparatus with respect to a second part of the lithographic apparatus in the Z-direction such that the first part is moveable in the Y-direction relative to the second part. Permanent magnet 21 is coupled to a moveable first part of the lithographic apparatus and permanent magnets 23 are coupled to a non moveable second part of the lithographic apparatus. The field orientation of the permanent magnets 21 and 23 is indicated by the arrows in the magnets and is substantially parallel to the Z-direction. Permanent magnet 21 has a substantially opposite polarity to permanent magnets 23. Magnetic forces between magnet 21 and magnets 23 create a repulsive force which forms a bearing with an improved stiffness. Permanent magnet 21 may also include two or more permanent magnets 25 which would act as a single large permanent magnet. The permanent magnet 21 may also have a slight offset in the X direction which makes the first moveable part also moveable over a short range in the X direction, while decreasing the stiffness in the Z direction only by a small amount. The X, Y and Z directions are orthogonal with respect to each other. The bearing restricts rotational movements Ry (around the Y-direction) and Rx (around the X-direction).
    Figure 3 depicts a view in three dimensions of the bearing of Figure 2. Permanent magnet 21 may be moveable with respect to permanent magnets 23 in the Y-direction over a relatively long range and in the X-direction over a relatively short distance, while the permanent magnets 23 take care of bearing or supporting permanent magnet 21 in or substantially parallel to the Z-direction.
    Figure 4 depicts a support 25 that may be the support MT configured to support the patterning device MA, or the substrate table WT configured to support that substrate W (see Figure 1) in the lithographic apparatus. The support 25 includes a bearing according to the invention. Substantially in between permanent magnets 23, configured in a linear shape, permanent magnets 21 provide a bearing for the support 25 in or substantially parallel to the Z-direction. In an embodiment, the bearing may have a stiffness in the Z direction that is larger than 50 N / mm, or larger than 80 N / mm. In an embodiment, the bearing may have a negative stiffness in a direction substantially perpendicular to the Z-direction. The support 25 may be moveable in the Y-direction over a relatively long range and in the X-direction over a relatively short range. The support 25 may also be used for supporting a reticle masking device. The reticle masking device may be constructed and arranged to determine a size of a radiation beam on the patterning device. The reticle masking device may include blades that are synchronously moveable with the patterning device MA.
    Figure 5 depicts the support of Figure 4 according to an embodiment of the invention. The support 25 includes actuators and sensors which can be used in a lithographic apparatus on the X-Y plane on the right side and in the X-Z plane on the left side. The support 25 is moveable in the Y-direction on a bearing including permanent magnets 23 and moveable permanent magnets 21. The support is provided with at least one actuator for actuating the support 25 in at least one of the remaining / other degrees of freedom ( ie the X-direction, Y-direction and / or rotation around the Z-direction (Rz) by exerting a force between the moveable support 25 and the rest of the lithographic apparatus, eg in a direction perpendicular to the Z-direction. The actuator is a Lorentz-force motor including a magnet 27 provided to support 25 and a coil 29 connected to the rest of the apparatus for movements in the Y-direction. Another actuator being a Lorentz motor comprises a magnet 26 and coils 28 for movements in the X-direction.
    Figures 6A and 6B depict configurations of permanent magnets according to further afield of the invention. In Figure 6A, permanent magnet 21 is provided for bearing substantially in the Z-direction between permanent magnets 23. The field orientation of the permanent magnets, indicated with an arrow is substantially parallel to the Z-direction. In Figure 6B, an alternative is disclosed permanent magnets 31 are connected to a moveable part via a mounting frame 35. The magnets provide bearing in substantially the Z-direction with respect to permanent magnet 33 which is mounted to a non-moving part of the lithographic apparatus.
    Figures 7A, 7B and 7C depict configurations of permanent magnets according to further invention of the invention. Figure 7A depicts a bearing of permanent magnets 37 are positioned in a so-called Halbach array so as to improve the strength of the magnet field between the permanent magnets 23 connected to the not moveable part and the magnet 21 connected to the moveable part of the lithographic projection apparatus. The field orientation of the permanent magnets 37 indicated by an arrow in the Halbach configuration is perpendicular the Z-direction. The field orientation of the permanent magnets 21, 23 indicated with an arrow is substantially parallel to the Z-direction. Figure 7B depicts a bearing of the moveable magnet 21 is divided into two permanent magnets 41.43 with substantially opposite polarity and the polarity of the lower part of the non moveable part of the bearing has a substantial opposite polarity with respect to Figure 7A. The magnets provided to the non-moveable part of the bearing are also provided with Halbach magnets 37. In Figure 7C the moveable magnets 41.43 are also provided with Halbach magnets 39 to enhance the magnetic field in between the moveable part of the bearing and the non-moveable part of the bearing.
    Figure 8 depicts configurations of permanent magnets according to further elaborations of the invention. Similar as in Figure 7C, the moveable part of the bearing and the non moveable part of the bearing are provided with Halbach magnets. The non-moveable part is provided with two Halbach magnets 37 and the moveable part with two Halbach magnets 39. The non-moveable part is provided with four permanent magnets 23 and the moveable part with four permanent magnets 21 the field orientation of the permanent magnets 21, 23, indicated with an arrow is substantially parallel to the Z-direction.
    The bearing according to the invention may be used as a bearing for a masking device for masking a radiation beam. United States Patent Application Publication No. 2006/0139615, incorporated by reference discloses such a masking device. The masking device includes a guiding mechanism for a movable structure such as a mask blade, a movable part connected to the movable structure, and a substantial stationary part to guide the movable part. The movable part includes a motor drive part and a counter weight part connected to an end of the motor drive part facing away from the movable structure.
    Although specific reference may be made in this text to the use of lithographic apparatus in the manufacture of ICs, it should be understood that the lithographic apparatus described may have other applications, such as the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, flat-panel displays, liquid-crystal displays (LCDs), thin-film magnetic heads, etc. The skilled artisan will appreciate that, in the context of such alternative applications, any use of the terms "wafer "or" die "Read may be considered as synonymous with the more general terms" substrate "or" target portion ", respectively. The substrate referred to may be processed, before or after exposure, in for example a track (a tool that typically applies to a layer of resist to a substrate and develops the exposed resist), a metrology tool and / or an inspection tool. Where applicable, the disclosure may be applied to such and other substrate processing tools. Further, the substrate may be processed more than once, for example in order to create a multi-layer IC, so the term substrate used may also refer to a substrate that already contains multiple processed layers.
    Although specific reference may have been made above to the use of the invention in the context of optical lithography, it will be appreciated that the invention may be used in other applications, for example imprint lithography, and where the context allows , is not limited to optical lithography. In imprint lithography a topography in a patterning device the pattern created on a substrate. The topography of the patterning device may be pressed into a layer or resist supplied to the substrate whereupon the resist is cured by applying electromagnetic radiation, heat, pressure or a combination thereof. The patterning device is moved out of the resist leaving a pattern in it after the resist is cured.
    The terms "radiation" and "beam" used include compass and all types of electromagnetic radiation, including ultraviolet (UV) radiation (eg having a wavelength or about 365,248.193, 157 or 126 nm) and extreme ultra-violet (EUV) radiation (eg having a wavelength in the range of 5-20 nm), as well as particle beams, such as ion beams or electron beams.
    The term "lens", where the context allows, may refer to any one or combination of various types of optical components, including refractive, reflective, magnetic, electromagnetic and electrostatic optical components.
    While specific expired of the invention have been described above, it will be appreciated that the invention may be practiced otherwise than as described. For example, the invention may take the form of a computer program containing one or more sequences of machine-readable instructions describing a method as disclosed above, or a data storage medium (eg semiconductor memory, magnetic or optical disk) having such a computer program stored therein.
    The descriptions above are intended to be illustrative, not limiting. Thus, it will be apparent to one skilled in the art that modifications may be made to the invention as described without departing from the scope or the clausess set out below. Other aspects of the invention set out in the following numbered clauses: 1 A lithographic apparatus including: an illumination system configured to provide a radiation beam; a support configured to support a patterning device, the patterning device being configured to transmit the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a bearing configured to support a first part of the lithographic apparatus with respect to a second part of the lithographic apparatus in a first direction (s) such that the first part is moveable in a second direction (y) relative to the second part, where the second direction (y) is substantially perpendicular to the first direction (z), and the first part is coupled to at least one permanent magnet, and the second part is coupled to at least two permanent magnets, and being the permanent magnet or the first part is positioned substantially in between the permanent magnets or the second part, and a field orientation of the permanent magnets is substantially parallel to the first direction and is the least one permanent magnet or the first part has a substantially opposite polarity to at least one of the magnets of the second part, and bearing the bearing restricts rotational movement (Ry) or the first part around the second direction (y) and wh erein the bearing restricts rotational movement (Rx) or the first part around a third direction (x), the third direction (x) is substantially perpendicular to the first direction (z) and the second direction (y). 2. The lithographic apparatus according to clauses 1, according to the lithographic apparatus further comprises at least one actuator configured to actuate the first part in at least one other degree of freedom (x, y and / or Rz) by exerting a force between the first part and the second part. 3. The lithographic apparatus according to clauses 2, the lithographic apparatus further comprises a control system coupled to the least one actuator, the control system is configured to control actuation or the first part in the least one other degree of freedom ( x, y and / or Rz). 4. The lithographic apparatus according to any one of clausess 1 to 3, where the first part is a masking device configured to mask a part of the radiation beam. 5. A device manufacturing method including: providing a substrate that is at least partially covered by a layer of radiation-sensitive material on a substrate table; providing a patterning device on a support; projecting a patterned beam or radiation onto the layer or radiation sensitive material; supporting with a bearing a first part of the lithographic apparatus with respect to a second part of the lithographic apparatus in a first direction (s) such that the first part is moveable in a second direction (y) second direction (y) is substantially perpendicular to the first direction (z), and the first part is coupled to at least one permanent magnet, and the second part is coupled to at least two permanent magnets, and being the permanent magnet or the first part is positioned substantially in between the permanent magnets or the second part, and a field orientation of the permanent magnets is substantially parallel to the first direction and is the least one permanent magnet or the first part has a substantial opposite polarity to at least one of the magnets of the second part: restricting rotational movement (Ry) or the first part around the second direction (y); restricting rotational movement (Rx) or the first part around a third direction (x), the third direction (x) being substantially perpendicular to the first direction (z) and the second direction (y); moving the first part with respect to the second part; developing the layer or sensitive material on the substrate; and manufacturing a device from the developed substrate. 6. The method according to clauses 5, further including: actuating the first part in at least one other degree of freedom (x, y and / or Rz) by exerting a force between the first part and the second part. 7. The method according to clauses 6, the method further comprises: controlling the actuation of the first part in the least one other degree of freedom (x, y and / or Rz). 8. The method according to any one of clauses 5 to 7, the first part is a masking device and the method further comprises masking a part of the radiation beam by the masking device.
    权利要求:
    Claims (1)
    [1]
    A lithography device comprising: an illumination device adapted to provide a radiation beam; a carrier constructed to support a patterning device, the patterning device being capable of applying a pattern in a section of the radiation beam to form a patterned radiation beam; a substrate table constructed to support a substrate; and a projection device adapted to project the patterned radiation beam onto a target area of the substrate, characterized in that the substrate table is adapted to position the target area of the substrate in a focal plane of the projection device.
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    法律状态:
    2010-01-04| AD1A| A request for search or an international type search has been filed|
    优先权:
    申请号 | 申请日 | 专利标题
    US7134608P| true| 2008-04-23|2008-04-23|
    US7134608|2008-04-23|
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